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16th International Conference on Atomic Layer Deposition, 24th-27th July 2016, Dublin, Ireland

Conference Photographs

These are just a selection of images, to see more photographs from the ALD 2016 conference visit:

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ALE Workshop
- ALE Workshop Overview
- ALE Workshop Programme
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ALD on the road to Dublin
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About Ireland
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Tyndall National Institute Tour
Conference Photographs
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Bald Engineering Articles

LG Technology Ventures & Mitsui Kinzoku-SBI Material Innovation Fund Join Forge Nano Inc. Series A 18th October 2019 Jonas Sundqvist
Cornell NanoScale Facility (CNF) and Plasma-Therm Collaborate on Atomic Layer Etching (ALE) 18th October 2019 Jonas Sundqvist
The Nobel Prize in Chemistry 2019 - A highly competitive breeding ground for new IP 17th October 2019 Jonas Sundqvist
Intel Oregon is looking for young CVD, ALD and PVD experts 17th October 2019 Jonas Sundqvist
What can Atomic Layer Deposition do for solar cells 16th October 2019 Jonas Sundqvist

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Key Dates

Registration opens: Friday, 1st January 2016.
Early bird registration closes: Thursday, 31 March 2016.
Abstract submission opens: Monday, 4th January 2016.
Abstract submission closes: Sunday, 21st February 2016.
Author notification: Thursday, 24th March 2016.
Conference opens: Sunday, 24th July 2016.
Conference concludes: Wednesday, 27th July 2016.

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