16th International Conference on Atomic Layer Deposition, 24th-27th July 2016, Dublin, Ireland

ALE Workshop Programme

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Tutorial on Atomic-Layer-Processing, Sunday 24th July:

Click on the speaker name to view their profile:

Speaker Organisation Title
Sumit Agarwal Colorado School of Mines USA Plasma Physics and Diagnostics
Stephan Wege Plasway GmbH, Germany Plasma Processing Reactor Design
Keren Kanarik Lam Research, USA Overview of Atomic Layer Etching
Fred Roozeboom Eindhoven University of Technology   and   TNO Eindhoven Processing for 3D-IC Technologies
Sean Barry Carleton University, Canada ALD Precursor Design & Synthesis
Massimo Tallarida Alba, Spain, Characterization of ALD processes and Materials using Synchrotron Light
Annelies Delabie IMEC, Belgium Atomic layer processing of 2D materials for beyond CMOS applications

ALE Workshop, Monday 25th July:
Plenary Speaker:
Ankur Agarwal, Applied Materials

Invited Speakers:
Steven George, University of Colorado, Boulder
Dennis van Dorp, IMEC
Akira Koshiishi, Tokyo Electron
Kazunori Shinoda, Hitachi Hi-Tech


Tyndall National Institute
Hooking together European Research in Atomic Layer Deposition
COST European Cooperation in Science and Technology
Lund University
Failte Ireland
Meet in Ireland
Science Foundation Ireland