ALD2016 attendance at CMC 2016
Two of the speakers, Dr. S.I. Lee (CTO Veeco) presenting “Low Temp Spatial ALD for Multiple Patterning Materials ” and Dr. Jean Marc Girard (CTO Air Liquide) presenting “ALD Precursor Development Challenges for HVM” as well as being part of the conference committee. There will be an opportunity to meet both gentlemen ALD 2016 in Dublin.
Hiromichi Enami form Hitachi High-Tech will be attending ALD 2016 and ALE 2016. Here he is asking CMC Co-Chair Ed Korczynski if he plan to come to Dublin.
Part of Team ZyALD(TM): Ravi Laxman (Linde), Jonas Sundqvist, Ashotosh Misra (Air Liquide) and Jean Marc Girard (Air Liquide). All of whom will come to Dublin!
Rasirc presenting “Hydrazine as a Low Temperature Nitride Source: Materials Challenges for High Volume Manufacturing ” at the event, posing Dan Alvarez CTO and Jeff Spiegelman President and Founder. Bothe gentlemen will attend, present and exhibit at ALD2016!
Angel Yanguas-Gil, a staff scientist at Argonne National Laboratory‘s Energy Systems Division, and Jonas Sundqvist happy to meet again at ALD 2016 in Dublin!
Jonas Sundqvist, Co-Chair of ALD2016 is attending the Critical Materials Conference (CMC 2016) on the 5th and 6th May in Hillsboro, Oregon. Check out his ALD2016 polo!
ALD and ALE 2016 Site Visit at the Convention Centre Dublin
ALD 2016 Conference Co-Chair Simon Elliott and ALE Chair Bert Ellingboe, along with Happening Conferences and Events, met on Thursday 28 April at the CCD in Dublin to finalise plans for the conference. It is going to be an exciting 4 days in July and we can’t wait to welcome everyone to Dublin!
In collaboration with the EU COST networking project HERALD (working group 4), NaMLab invited to the Novel High-k Application Workshop.
New challenges offered by the application of high-k dielectric materials in micro– and nanoelectronics were discussed by more than 80 participants from industry, research institutes and universities. NaMLab created with the workshop a stimulating European platform for application-oriented scientist to exchange ideas and discuss the latest experimental results on MIM-capacitors, process technology, leakage and reliability as well as characterization of high-k dielectrics integrated in silicon based micro– and nanoelectronics. In addition, new results in the field of ALD dielectrics in solar cells, transparent conduction oxides (TCOs) and atomic layer etching (ALE) was discussed.
Dr. Jonas Sundqvist from Lund University / TU Dresden and Co-Chair of ALD 2016, chairing and presenting at the Atomic Layer Etching session.
Dr. Dmitry Suyatin from Lund university presenting groundbreaking work on splitting Nanowires be ALE.
Dr. Riikka Puurunen from VTT and Dr Tobias Törndal from Uppsala University.
Prof. Fred Roozeboom from TU Eindhoven/TNO presenting “Spatial Atomic Layer Etching”. We look forward to hearing from Fred at ALD 2016.
Marcel Junige from IHM TU Dresden presenting “Chemical path to ALE”.
Dr. Karim Cherkaoui, Nanoelectronic Materials and Devices Group (NMD), Tyndall National Lab, Ireland giving a talk on High-k on III/V semiconductors.
Dr. Simon Elliott from Tyndall National Lab and Co-Chair of ALD 2016 asking some difficult questions!
Two of the sponsors of the event, Jamal Belgacem from Strem and Andreas Stamm Oxford Instruments.
Dr. Uwe Schröder from NaMLab organizer of the workshop, Chair of ALD2012 and on the Scientific Committee of ALD2016 discussing Memory Technology with Prof. Jan van Houdt from Imec.
Additional sponsors of the event – Sara Wengström from Swedish FAB Support and Paul Williams from Pegasus discussing precursors with very important customers from Fraunhofer IKTS.
Pegasus Chemical and FabSupport Team.
Many thanks to photographers – Martin Knaut, Jonas Sundqvist and Maik Simon from NaMLab.