16th International Conference on Atomic Layer Deposition, 24th-27th July 2016, Dublin, Ireland

Welcome to the 16th Atomic Layer Deposition Conference

ALD 2016 Conference Logo

The 16th International Conference on Atomic Layer Deposition (ALD 2016) was a three-day meeting dedicated to the science and technology of atomic layer controlled deposition of thin films.  In every year since 2001, the conference had been held alternately in United States, Europe and Asia, allowing fruitful exchange of ideas, know-how and practices between scientists. This year, the ALD conference incorporated the Atomic Layer Etching 2016 Workshop, so that delegates at the two events could interact freely.  The conference took place on 24-27 July 2016 at the Convention Centre Dublin, Ireland.

Atomic Layer Deposition (ALD) is used to fabricate ultrathin and conformal thin film structures for many semiconductor and thin film device applications. A unique attribute of ALD is that it uses sequential self-limiting surface chemistry to achieve control of film growth in the monolayer or sub-monolayer thickness regime. ALD is receiving attention for its applications in leading-edge electronic technologies, advanced microsystems, displays, energy capture and storage, solid state lighting, biotechnologies and medical technologies. Indeed ALD is particularly advantageous for any advanced technology that requires control of film structure in the nanometer or sub-nanometer scale.

As in past conferences, the meeting was preceded by one day of tutorials. An industry trade show was held in conjunction with the conference, to act as common ground for academia and industry to meet and discuss the future applications of ALD. Extra opportunities for collaboration was also provided through working groups of the COST Action ‘Hooking together European research in atomic layer deposition (HERALD)’.

This conference offered an excellent opportunity to learn about the most recent R&D activities in ALD science and technology from researchers around the world. Thank you all for your participation!

ALD 2016 Co-Chairs:

Simon Elliott, Tyndall National Institute , Ireland Jonas Sundqvist, Division of Solid State Physics, Lund University, Sweden
Simon Elliott
Tyndall National Institute,
Jonas Sundqvist
Division of Solid State Physics,
Lund University, Sweden

2017 Conference:

17th International Conference on Atomic Layer Deposition – Featuring the 4th International Atomic Layer Etching Workshop (ALE2017)

July 15-18, 2017
Sheraton Denver, Denver, Colorado


Tyndall National Institute
Hooking together European Research in Atomic Layer Deposition
COST European Cooperation in Science and Technology
Lund University
Failte Ireland
Meet in Ireland
Science Foundation Ireland